Development of an optically gated Fe/n-GaAs spin-polarized transistor

J. Y. Kim, M. Samiepour, E. Jackson, J. Ryu, D. Iizasa, T. Saito, M. Kohda, J. Nitta, H. E. Beere, D. A. Ritchie, and A. Hirohata
Phys. Rev. B 106, 134404 – Published 7 October 2022

Abstract

Efficient modulation of electrically injected spin signals that is suitable for modern-day transistor functionality is yet to be established. In this work, we demonstrate in detail the fabrication of a Fe/n-GaAs spin injection device and the experimental setup for an optical gating of the nonlocal spin transport signal. In situ scanning electron microscopy interface imaging reveals more uniform current distribution at the Fe/n-GaAs injector interface at bias voltages higher than the Schottky barrier height. Three- and four-terminal Hanle measurements confirm successful spin injection into n-GaAs, with strong interfacial spin dephasing at high magnetic fields. A time-resolved pump-probe Kerr rotation setup was used to illuminate circularly polarized light in the region of the pure spin current in Fe/n-GaAs lateral spin injection devices, where (0.4±0.3)% modulation of the nonlocal signal depending on the light helicity was observed at 30 K.

  • Figure
  • Figure
  • Figure
  • Figure
  • Received 6 February 2022
  • Revised 20 July 2022
  • Accepted 13 September 2022

DOI:https://doi.org/10.1103/PhysRevB.106.134404

©2022 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

J. Y. Kim1,2, M. Samiepour3,*, E. Jackson3,†, J. Ryu4,‡, D. Iizasa4, T. Saito4, M. Kohda4,5,6, J. Nitta4,5,6, H. E. Beere7, D. A. Ritchie7, and A. Hirohata3,§

  • 1Department of Physics, University of York, York YO10 5DD, United Kingdom
  • 2Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), 138634, Singapore
  • 3Department of Electronic Engineering, University of York, York YO10 5DD, United Kingdom
  • 4Department of Materials Science, Tohoku University, Sendai 980-8579, Japan
  • 5Spintronics Research Network, Tohoku University, Sendai 980-8579, Japan
  • 6Organisation for Advanced Studies, Center for Science and Innovation in Spintronics (Core Research Cluster), Tohoku University, Sendai 980-8579, Japan
  • 7Department of Physics, University of Cambridge, Cambridge CB3 0HE, United Kingdom

  • *Present address: Seagate Technology, Londonderry BT48 0LY, United Kingdom.
  • Present address: Oxford Instruments, Abingdon OX13 5QX, United Kingdom.
  • Present address: Samsung Advanced Institute of Technology, Suwon 16678, Republic of Korea.
  • §atsufumi.hirohata@york.ac.uk

Article Text (Subscription Required)

Click to Expand

Supplemental Material (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 106, Iss. 13 — 1 October 2022

Reuse & Permissions
Access Options
CHORUS

Article Available via CHORUS

Download Accepted Manuscript
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×