Strain-gated nonlinear Hall effect in two-dimensional MoSe2/WSe2 van der Waals heterostructure

Hao Jin, Hongjie Su, Xinru Li, Yunjin Yu, Hong Guo, and Yadong Wei
Phys. Rev. B 104, 195404 – Published 4 November 2021
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Abstract

It is recently found that the Hall effect can survive in the presence of time-reversal symmetry but with inversion-symmetry breaking, which is known as the nonlinear Hall effect. So far, the studies concerning the nonlinear Hall effect are mainly focused on the homogeneous systems, while less attention has been paid to the van der Waals (vdW) heterostructure, which in fact naturally breaks the spatial inversion symmetry. In this study, we systematically study the nonlinear electric response in 1T-phase MoSe2/WSe2 vdW heterostructure. Our results demonstrate that MoSe2/WSe2 vdW heterostructure owns a large Berry curvature dipole, which is comparable with those of homogeneous multilayers and much larger than that predicted for monolayers under the in-plane uniaxial strain. In addition, the nonlinear Hall response in vdW heterostructure is sensitive to the relative position between the Fermi energy and tilted Dirac cones, and can be effectively manipulated from positive to negative values by applying an out-of-plane strain. Further study indicates that this can be ascribed to the charge transfer within the vdW interlayer. Based on these findings, our work provides a fundamental understanding of the nature of strain-gated nonlinear Hall effect in vdW heterostructures, which may facilitate the design of novel high-frequency nanodevices.

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  • Received 1 September 2021
  • Revised 14 October 2021
  • Accepted 26 October 2021

DOI:https://doi.org/10.1103/PhysRevB.104.195404

©2021 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Hao Jin1,2, Hongjie Su1, Xinru Li1,*, Yunjin Yu1, Hong Guo1,3, and Yadong Wei1,2

  • 1College of Physics and Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, China
  • 2Shenzhen Key Laboratory of Advanced Thin Films and Applications, Shenzhen University, Shenzhen 518060, China
  • 3Centre for the Physics of Materials and Department of Physics, McGill University, Montréal, Canada H3A 2T8

  • *xrli@szu.edu.cn

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Issue

Vol. 104, Iss. 19 — 15 November 2021

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