Abstract
We studied flux pinning in exfoliated thin-film devices with a thickness from 30 to 150 nm by measuring the critical current density . In bulk , the flux pinning has been discussed in the framework of weak collective pinning, while there is little knowledge on the pinning mechanism in the thin-film region. From the thickness dependence of at a fixed magnetic field of 1 T, we found that the strong pinning is dominant below nm, while the weak collective pinning becomes more important above nm. This crossover thickness can be explained by the theoretical model proposed by van der Beek et al. [Phys. Rev. B 66, 024523 (2002)].
- Received 16 July 2021
- Revised 26 September 2021
- Accepted 7 October 2021
DOI:https://doi.org/10.1103/PhysRevB.104.165412
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