Correlation hard gap in antidot graphene

Jie Pan, Sheng-Shiuan Yeh, Haijing Zhang, David G. Rees, Ting Zhang, Bing Zhang, Juhn-Jong Lin, and Ping Sheng
Phys. Rev. B 103, 235114 – Published 8 June 2021
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Abstract

We have measured low-temperature variation of resistance and nonlinear current-voltage behavior in antidot graphene in the vicinity of the charge neutrality point. The data are found to be consistent with the manifestations of a variable-range hopping electronic density of states (DOS) with a small hard gap of 1 meV around the Fermi level, in conjunction with a parallel tunneling conduction channel that exists at the center of the gap. The hard gap is confirmed by the appearance of a low-conductive plateau at low-bias electric field, whereas the parallel tunneling conduction channel, with temperature-independent conductance, is manifest through the nonlinear electric field variation. Unified good agreement between the temperature and electric field dependencies of conductance, for both channels, is obtained with the predictions of a proposed DOS model. An increase in the gap size with applied magnetic field is observed.

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  • Received 23 November 2020
  • Revised 23 May 2021
  • Accepted 25 May 2021

DOI:https://doi.org/10.1103/PhysRevB.103.235114

©2021 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Jie Pan1,*, Sheng-Shiuan Yeh2,3,*, Haijing Zhang1,†, David G. Rees2,‡, Ting Zhang1, Bing Zhang1, Juhn-Jong Lin2,4,§, and Ping Sheng1,∥

  • 1Department of Physics, HKUST, Clear Water Bay, Kowloon, Hong Kong, China
  • 2Institute of Physics and Center for Emergent Functional Matter Science, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan
  • 3International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan
  • 4Department of Electrophysics, National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan

  • *These authors contributed equally to this work.
  • Present address: Max-Planck-Institute for Chemical Physics of Solids, Nöthnitzer Straße 40, Dresden, Germany.
  • Present address: Cryogenic Ltd, 6 Acton Park Estate, The Vale, London W3 7QE, United Kingdom.
  • §jjlin@mail.nctu.edu.tw
  • Corresponding author: sheng@ust.hk

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Issue

Vol. 103, Iss. 23 — 15 June 2021

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