Total reflection hard x-ray photoelectron spectroscopy: Applications to strongly correlated electron systems

T. Mizutani, S. Tanaka, T. Saze, K. Fujii, H. Matsuoka, M. Nakano, H. Wadati, M. Kitamura, K. Horiba, Y. Iwasa, H. Kumigashira, M. Yoshiki, and M. Taguchi
Phys. Rev. B 103, 205113 – Published 7 May 2021

Abstract

We demonstrate that total reflection hard x-ray photoelectron spectroscopy (TR-HAXPES) is a versatile method for elucidating a difference between surface and bulk electronic states of strongly correlated electron systems, complementing conventional bulk sensitive hard x-ray photoelectron spectroscopy (HAXPES). To demonstrate the experimental feasibility of the method, we investigated La0.6Sr0.4MnO3 and the electron-doped high-TC superconductor La1.9Ce0.1CuO4. From the incident angle dependence of the spectral line shapes, we found that the surface-sensitive TR-HAXPES measurement equivalent to soft x-ray photoelectron spectroscopy is possible in the total reflection condition. The results strongly suggest that this method allows us to measure both surface and bulk electronic states without making any changes to experimental setup such as the energy resolution, x-ray energy, and the beamline.

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  • Received 29 August 2020
  • Revised 4 February 2021
  • Accepted 24 March 2021

DOI:https://doi.org/10.1103/PhysRevB.103.205113

©2021 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

T. Mizutani1, S. Tanaka1, T. Saze1, K. Fujii2, H. Matsuoka3, M. Nakano3, H. Wadati3,4,5, M. Kitamura6, K. Horiba6, Y. Iwasa3, H. Kumigashira6,7, M. Yoshiki2, and M. Taguchi1,*

  • 1Toshiba Nanoanalysis Corporation, Kawasaki 212-8583, Japan
  • 2Corporate Research and Development Center, Toshiba Corporation, Kawasaki 212-8582, Japan
  • 3Department of Applied Physics, University of Tokyo, Bunkyo-ku 113-8656, Japan
  • 4Graduate School of Material Science, University of Hyogo, Ako-gun 678-1297, Japan
  • 5Institute of Laser Engineering, Osaka University, Suita, Osaka 5650871, Japan
  • 6Institute of Materials Structure Science, High Energy Accelerator Research Organization, Tsukuba 305-0801, Japan
  • 7Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan

  • *Corresponding author: munetaka.taguchi@nanoanalysis.co.jp

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Issue

Vol. 103, Iss. 20 — 15 May 2021

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