Low-frequency charge noise in Si/SiGe quantum dots

Elliot J. Connors, JJ Nelson, Haifeng Qiao, Lisa F. Edge, and John M. Nichol
Phys. Rev. B 100, 165305 – Published 23 October 2019; Erratum Phys. Rev. B 102, 039902 (2020)
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Abstract

Electron spins in silicon have long coherence times and are a promising qubit platform. However, electric field noise in semiconductors poses a challenge for most single- and multiqubit operations in quantum-dot spin qubits. We investigate the dependence of low-frequency charge noise spectra on temperature and aluminum-oxide gate dielectric thickness in Si/SiGe quantum dots with overlapping gates. We find that charge noise increases with aluminum-oxide thickness. We also find strong dot-to-dot variations in the temperature dependence of the noise magnitude and spectrum. These findings suggest that each quantum dot experiences noise caused by a distinct ensemble of two-level systems, each of which has a nonuniform distribution of thermal activation energies. Taken together, our results suggest that charge noise in Si/SiGe quantum dots originates at least in part from a nonuniform distribution of two-level systems near the surface of the semiconductor.

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  • Received 25 July 2019
  • Revised 26 September 2019

DOI:https://doi.org/10.1103/PhysRevB.100.165305

©2019 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied PhysicsQuantum Information, Science & Technology

Erratum

Erratum: Low-frequency charge noise in Si/SiGe quantum dots [Phys. Rev. B 100, 165305 (2019)]

Elliot J. Connors, JJ Nelson, Haifeng Qiao, Lisa F. Edge, and John M. Nichol
Phys. Rev. B 102, 039902 (2020)

Authors & Affiliations

Elliot J. Connors1, JJ Nelson1, Haifeng Qiao1, Lisa F. Edge2, and John M. Nichol1,*

  • 1Department of Physics and Astronomy, University of Rochester, Rochester, New York 14627, USA
  • 2HRL Laboratories LLC, 3011 Malibu Canyon Road, Malibu, California 90265, USA

  • *jnich10@ur.rochester.edu

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Issue

Vol. 100, Iss. 16 — 15 October 2019

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