d-wave superconducting gap observed in protect-annealed electron-doped cuprate superconductors Pr1.3xLa0.7CexCuO4

M. Horio, K. Koshiishi, S. Nakata, K. Hagiwara, Y. Ota, K. Okazaki, S. Shin, S. Ideta, K. Tanaka, A. Takahashi, T. Ohgi, T. Adachi, Y. Koike, and A. Fujimori
Phys. Rev. B 100, 054517 – Published 28 August 2019

Abstract

For electron-doped cuprates, the strong suppression of antiferromagnetic spin correlation by efficient reduction annealing by the “protect-annealing” method leads to superconductivity not only with lower Ce concentrations but also with higher transition temperatures. To reveal the nature of this superconducting state, we have performed angle-resolved photoemission spectroscopy measurements of protect-annealed electron-doped superconductors Pr1.3xLa0.7CexCuO4 and directly investigated the superconducting gap. The gap was found to be consistent with d-wave symmetry, suggesting that strong electron correlation persists and hence antiferromagnetic spin fluctuations remain a candidate that mediates Copper pairing in the protect-annealed electron-doped cuprates.

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  • Received 16 May 2019
  • Revised 12 August 2019

DOI:https://doi.org/10.1103/PhysRevB.100.054517

©2019 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

M. Horio1,*, K. Koshiishi1, S. Nakata1, K. Hagiwara1, Y. Ota2, K. Okazaki2, S. Shin2, S. Ideta3, K. Tanaka3, A. Takahashi4, T. Ohgi4, T. Adachi5, Y. Koike4, and A. Fujimori1,6

  • 1Department of Physics, University of Tokyo, Bunkyo-ku, Tokyo 113-0033, Japan
  • 2Institute for Solid State Physics, University of Tokyo, Kashiwa, Chiba 277-8581, Japan
  • 3UVSOR Facility, Institute for Molecular Science, Okazaki 444-8585, Japan
  • 4Department of Applied Physics, Tohoku University, Sendai 980-8579, Japan
  • 5Department of Engineering and Applied Sciences, Sophia University, Tokyo 102-8554, Japan
  • 6Department of Applied Physics, Waseda University, Tokyo 169-8555, Japan

  • *horio@physik.uzh.ch

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Vol. 100, Iss. 5 — 1 August 2019

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