Bias Dependence of the Electrical Spin Injection into GaAs from CoFeB/MgO Injectors with Different MgO Growth Processes

P. Barate, S. H. Liang, T. T. Zhang, J. Frougier, B. Xu, P. Schieffer, M. Vidal, H. Jaffrès, B. Lépine, S. Tricot, F. Cadiz, T. Garandel, J. M. George, T. Amand, X. Devaux, M. Hehn, S. Mangin, B. Tao, X. F. Han, Z. G. Wang, X. Marie, Y. Lu, and P. Renucci
Phys. Rev. Applied 8, 054027 – Published 13 November 2017

Abstract

We investigate the influence of the MgO growth process on the bias dependence of the electrical spin injection from a CoFeB/MgO spin injector into a GaAs-based light-emitting diode (spin LED). With this aim, textured MgO tunnel barriers are fabricated either by sputtering or molecular-beam-epitaxy (MBE) methods. For the given growth parameters used for the two techniques, we observe that the circular polarization of the electroluminescence emitted by spin LEDs is rather stable as a function of the injected current or applied bias for the samples with sputtered tunnel barriers, whereas the corresponding circular polarization decreases abruptly for tunnel barriers grown by MBE. We attribute these different behaviors to the different kinetic energies of the injected carriers linked to differing amplitudes of the parasitic hole current flowing from GaAs to Co-Fe-B in both cases.

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  • Received 24 April 2017

DOI:https://doi.org/10.1103/PhysRevApplied.8.054027

© 2017 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

P. Barate1, S. H. Liang2,6, T. T. Zhang1, J. Frougier3, B. Xu4, P. Schieffer5, M. Vidal1, H. Jaffrès3, B. Lépine5, S. Tricot5, F. Cadiz1, T. Garandel1, J. M. George3, T. Amand1, X. Devaux2, M. Hehn2, S. Mangin2, B. Tao6, X. F. Han6, Z. G. Wang4, X. Marie1, Y. Lu2,*, and P. Renucci1,†

  • 1Université de Toulouse, INSA-CNRS-UPS, LPCNO, 135 Avenue de Rangueil, 31077 Toulouse, France
  • 2Institut Jean Lamour, UMR 7198, CNRS—Université de Lorraine, B.P. 239, 54506 Vandoeuvre, France
  • 3Unité Mixte de Physique CNRS/Thales and Université Paris–Sud 11, 1 Avenue Augustin Fresnel, 91767 Palaiseau, France
  • 4Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083, China
  • 5Département Matériaux et Nanosciences, Institut de Physique de Rennes, UMR 6251, CNRS—Université de Rennes 1, Campus de Beaulieu, Bat 11 E, 35042 Rennes Cedex, France
  • 6Beijing National Laboratory of Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China

  • *yuan.lu@univ-lorraine.fr
  • renucci@insa-toulouse.fr

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Vol. 8, Iss. 5 — November 2017

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