Abstract
Absolute photoionization cross-section measurements for a mixture of ground and metastable states of , , and are reported in the photon energy range of transitions, which occur within or adjacent to the window for extreme ultraviolet lithography light source development. The reported values allow the quantification of opacity effects in xenon plasmas due to these autoionizing states. The oscillator strengths for the and transitions in ions are calculated using nonrelativistic Hartree-Fock and random phase approximations. These are compared with published experimental values for to and with the values obtained from the present experimental cross-section measurements for to . The calculations assisted in the determination of the metastable content in the ion beams for and . The experiments were performed by merging a synchrotron photon beam generated by an undulator beamline of the Advanced Light Source with an ion beam produced by an electron cyclotron resonance ion source.
- Received 21 December 2005
DOI:https://doi.org/10.1103/PhysRevA.73.032717
©2006 American Physical Society