Abstract
The Si x-ray production cross sections for ion impact in the energy range of 0.4-2.2 MeV/amu are determined in the limit of a vanishingly thin target from the observed target thickness dependence of the x-ray yields. The ionization cross sections are deduced from the measured x-ray production cross sections using an average fluorescence yield (, where is the fluorescence yield for an atom with single vacancy) determined from high-resolution x-ray spectra and configuration fluorescence yields. For () ion impact, the measured ionization cross sections are compared with the plane-wave-Born-approximation prediction with and without the Coulomb deflection and increased-binding-energy effects. The Si shell to F shell electron-transfer cross sections are determined from the difference between the ionization cross sections for ions and those for ions (). The results are compared with the prediction based on the two-state atomic-expansion method and that based on the modified Oppenheimer-Brinkman-Kramers approximation. A comparison is also made between the Si solid-target measurements with those obtained for gaseous Ne and Ar gas targets. The solid-target and gas-target data are consistent at 1.58 MeV/amu. Finally, from a comparison between the measured equilibrium x-ray yields and the calculated x-ray yields using the equilibrium charge distribution of projectiles after passing through foils, it is found that the projectiles have a considerably larger number of -shell vacancies inside solids than after passing through solids at lower-impact energies.
- Received 10 April 1978
DOI:https://doi.org/10.1103/PhysRevA.18.1373
©1978 American Physical Society