Photoelectron holography in strong-field tunneling ionization by a spatially inhomogeneous field

Yongkun Chen, Yueming Zhou, Jia Tan, Min Li, Wei Cao, and Peixiang Lu
Phys. Rev. A 104, 043107 – Published 12 October 2021

Abstract

Photoelectron holography in strong-field tunneling ionization is an efficient way to probe the structures and the ultrafast dynamics information of atoms and molecules. Manipulating the process of photoelectron holography is important for its application. Here, we study theoretically strong-field photoelectron holography in the spatially inhomogeneous field by solving the time-dependent Schrödinger equation. Our results show that the returning energy of the rescattering electron is greatly enhanced in the spatially inhomogeneous field, and the holographic interference pattern can be separated from other types of interference in the photoelectron momentum distribution. Moreover, our results show that the time window of tunneling ionization wherein the electron could be driven back to induce holography is broadened in the inhomogeneous field. These properties are beneficial for the application of photoelectron holography in probing the atomic and molecular structures and dynamics. The origin for these properties is analyzed with the classical trajectory model.

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  • Received 19 July 2021
  • Accepted 30 September 2021

DOI:https://doi.org/10.1103/PhysRevA.104.043107

©2021 American Physical Society

Physics Subject Headings (PhySH)

Atomic, Molecular & Optical

Authors & Affiliations

Yongkun Chen1, Yueming Zhou1,*, Jia Tan1,2, Min Li1, Wei Cao1, and Peixiang Lu1,3,4,†

  • 1School of Physics and Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China
  • 2Jiangsu Key Laboratory of Micro and Nano Heat Fluid Flow Technology and Energy Application, School of Physical Science and Technology, Suzhou University of Science and Technology, Suzhou, 215009, China
  • 3Hubei Key Laboratory of Optical Information and Pattern Recognition, Wuhan Institute of Technology, Wuhan 430205, China
  • 4CAS Center for Excellence in Ultra-intense Laser Science, Shanghai 201800, China

  • *zhouyueming@hust.edu.cn
  • lupeixiang@hust.edu.cn

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Issue

Vol. 104, Iss. 4 — October 2021

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