Abstract
X-ray diffraction patterns of vitreous Si and Ge have been made in an evacuated camera using Cu radiation monochromatized by crystal reflection. Intensity curves are obtained from the microphotometer records in the usual way. A method is developed for calculating the scattering of x-rays in an amorphous solid and is applied to the diffraction patterns of glass. In vitreous Si each Si is tetrahedrally surrounded by 4 oxygens at a distance Si—O=1.60A, and each oxygen is shared between two such tetrahedral groups. The resulting network which is built up is a random network, it does not repeat at regular intervals, and is accordingly non-crystalline. From this picture of the glassy state, scattering curves are calculated for vitreous Si and Ge which are in good agreement with the experimental curves.
- Received 30 January 1934
DOI:https://doi.org/10.1103/PhysRev.45.657
©1934 American Physical Society