Surface evolution during molecular-beam epitaxy deposition of GaAs

J. Sudijono, M. D. Johnson, C. W. Snyder, M. B. Elowitz, and B. G. Orr
Phys. Rev. Lett. 69, 2811 – Published 9 November 1992
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Abstract

Scanning tunneling microscopy studies have been performed on GaAs homoepitaxial films grown by molecular-beam epitaxy. Images show that in the earliest stages of deposition the morphology oscillates between one with two-dimensional islands and flat terraces. As growth proceeds there is a gradual coarsening of the surface features. Comparison with reflection high-energy electron diffraction (RHEED) leads us to propose that there is a direct correspondence between the surface step density and the RHEED specular intensity. As such, we associate the decay of the RHEED oscillation amplitude with a reduction in the temporal variation of the step density rather than the buildup of interface width.

  • Received 13 May 1992

DOI:https://doi.org/10.1103/PhysRevLett.69.2811

©1992 American Physical Society

Authors & Affiliations

J. Sudijono, M. D. Johnson, C. W. Snyder, M. B. Elowitz, and B. G. Orr

  • The Harrison M. Randall Laboratory, The University of Michigan, Ann Arbor, Michigan 48109-1120

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Vol. 69, Iss. 19 — 9 November 1992

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