Electrical and thermal properties of fluorine-intercalated graphite fibers

L. Piraux, V. Bayot, J. P. Issi, M. S. Dresselhaus, M. Endo, and T. Nakajima
Phys. Rev. B 41, 4961 – Published 15 March 1990
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Abstract

We report measurements on the electrical- and thermal-transport properties of fluorine-intercalated vapor-grown carbon fibers CxF with the carbon-to-fluorine-atom ratio x between 4.1 and 5.8. The electrical resistivity is found to be very sensitive to the fluorine concentration. Indeed, while the resistivities of the C5.2F and the C5.8F compounds are well below that of the pristine graphite fibers, the tendency is reversed when x≤4.5 and large resistivity values are obtained. All CxF compounds exhibit a logarithmic resistance increase at low temperature, which can consistently be explained by weak-localization and carrier-carrier interaction effects for two-dimensional electron systems. Large negative magnetoresistance values have been measured on the CxF compound with x=4.1. At higher temperature, an anomalous resistance-versus-temperature behavior appears for each fluorine-intercalated vapor-grown carbon fiber, possibly resulting from a phase transition. Heat transport in CxF (with x=4.1) is almost entirely governed by lattice vibrations between 2.5 and 300 K while the thermoelectric power is positive, and its temperature dependence is similar to that previously observed in other acceptor graphite intercalation compounds. Our results indicate that the high resistivity of the CxF compounds (with x≤4.5) is due to strong defect scattering rather than a low free-charge-carrier density.

  • Received 27 September 1989

DOI:https://doi.org/10.1103/PhysRevB.41.4961

©1990 American Physical Society

Authors & Affiliations

L. Piraux, V. Bayot, and J. P. Issi

  • Unité de Physico-Chimie et de Physique des Matériaux, Département des Sciences des Matériaux et des Procédés, Université Catholique de Louvain, place Croix de Sud 1, B-1348 Louvain-la-Neuve, Belgium

M. S. Dresselhaus

  • Department of Electrical Engineering and Computer Science and Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

M. Endo

  • Department of Electrical Engineering, Faculty of Engineering, Shinshu University, Nagano 380, Japan

T. Nakajima

  • Division of Molecular Engineering, Graduate School of Engineering, Kyoto University, Sakyo-ku, Kyoto 606, Japan

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Vol. 41, Iss. 8 — 15 March 1990

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