Electronic characterization of the ordering of a-Ge with the use of x-ray-absorption near-edge structure

T. I. Morrison, M. A. Paesler, Dale E. Sayers, Raphael Tsu, and Jesus Gonzalez-Hernandez
Phys. Rev. B 31, 5474 – Published 15 April 1985
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Abstract

The LIII-edge x-ray-absorption near-edge structure (XANES) of germanium is reported as a function of annealing temperature. There are no features in the XANES spectra for as-deposited films, but in an annealed sample (shown by Raman spectroscopy to be in a relaxed amorphous phase) a feature at 1221 eV appears. Upon crystallization of the sample, and additional feature at 1218 eV emerges. We conclude that the electronic environment in the relaxed state is different from that in the as-deposited state and that any accurate structural model of relaxed amorphous germanium must predict the XANES feature at 1221 eV.

  • Received 13 September 1984

DOI:https://doi.org/10.1103/PhysRevB.31.5474

©1985 American Physical Society

Authors & Affiliations

T. I. Morrison

  • Materials Science and Technology Division, Argonne National Laboratory, Argonne, Illinois 60439

M. A. Paesler and Dale E. Sayers

  • North Carolina State University, Raleigh, North Carolina 26750

Raphael Tsu and Jesus Gonzalez-Hernandez

  • Energy Conversion Devices, Incorporated, 1675 West Maple Road, Troy, Michigan 48084

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Vol. 31, Iss. 8 — 15 April 1985

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