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Structure determination of multilayer silicene grown on Ag(111) films by electron diffraction: Evidence for Ag segregation at the surface

Terufusa Shirai, Tetsuroh Shirasawa, Toru Hirahara, Naoya Fukui, Toshio Takahashi, and Shuji Hasegawa
Phys. Rev. B 89, 241403(R) – Published 10 June 2014; Erratum Phys. Rev. B 90, 039902 (2014)
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Abstract

The structure of multilayer silicene formed on Ag(111) films was studied by low-energy electron diffraction. It turned out that the experimental data cannot be explained by proposed models that only consider buckling of silicon atoms. We have rather found that multilayer silicene on Ag(111) is actually a thin film of bulklike silicon terminated with the Si(111)3×3-Ag surface. The results are compared to previous works and clearly show the importance to properly understand the structure of the system when discussing its electronic properties.

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  • Received 2 May 2014
  • Revised 28 May 2014

DOI:https://doi.org/10.1103/PhysRevB.89.241403

©2014 American Physical Society

Erratum

Authors & Affiliations

Terufusa Shirai1, Tetsuroh Shirasawa2,3, Toru Hirahara1,*, Naoya Fukui1, Toshio Takahashi2, and Shuji Hasegawa1

  • 1Department of Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan
  • 2Institute for Solid State Physics, University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa 277-8581, Japan
  • 3JST, PRESTO, 4-1-8 Honcho Kawaguchi, Saitama, Japan

  • *Present address: Department of Physics, Tokyo Institute of Technology, 2-12-1 Ookayama, Meguro-ku, Tokyo 152-8551, Japan; hirahara@phys.titech.ac.jp

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Issue

Vol. 89, Iss. 24 — 15 June 2014

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