Nonlinear Contact Effects in Staggered Thin-Film Transistors

Axel Fischer, Hilke Zündorf, Felix Kaschura, Johannes Widmer, Karl Leo, Ulrike Kraft, and Hagen Klauk
Phys. Rev. Applied 8, 054012 – Published 7 November 2017
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Abstract

The static and dynamic electrical characteristics of thin-film transistors (TFTs) are often limited by the parasitic contact resistances, especially for TFTs with a small channel length. For the smallest possible contact resistance, the staggered device architecture has a general advantage over the coplanar architecture of a larger injection area. Since the charge transport occurs over an extended area, it is inherently more difficult to develop an accurate analytical device model for staggered TFTs. Most analytical models for staggered TFTs, therefore, assume that the contact resistance is linear, even though this is commonly accepted not to be the case. Here, we introduce a semiphenomenological approach to accurately fit experimental data based on a highly discretized equivalent network circuit explicitly taking into account the inherent nonlinearity of the contact resistance. The model allows us to investigate the influence of nonlinear contact resistances on the static and dynamic performance of staggered TFTs for different contact layouts with a relatively short computation time. The precise extraction of device parameters enables us to calculate the transistor behavior as well as the potential for optimization in real circuits.

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  • Received 31 March 2017

DOI:https://doi.org/10.1103/PhysRevApplied.8.054012

© 2017 American Physical Society

Physics Subject Headings (PhySH)

Polymers & Soft MatterGeneral PhysicsCondensed Matter, Materials & Applied Physics

Authors & Affiliations

Axel Fischer*, Hilke Zündorf, Felix Kaschura, Johannes Widmer, and Karl Leo

  • Dresden Integrated Center for Applied Physics and Photonic Materials and Institute for Applied Physics, Technische Universität Dresden, Nöthnitzer Straße 61, 01187 Dresden, Germany

Ulrike Kraft and Hagen Klauk

  • Max Planck Institute for Solid State Research, Heisenbergstraße 1, 70569 Stuttgart, Germany

  • *Corresponding author. axel.fischer@iapp.de; www.iapp.de

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Issue

Vol. 8, Iss. 5 — November 2017

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