Full characterization of a high-gain saturated x-ray laser at 13.9 nm

S. Sebban, H. Daido, N. Sakaya, Y. Kato, K. Murai, H. Tang, Y. Gu, G. Huang, S. Wang, A. Klisnick, Ph. Zeitoun, F. Koike, and H. Takenaka
Phys. Rev. A 61, 043810 – Published 17 March 2000
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Abstract

We report the characterization of a saturated collisional Ni-like Ag soft-x-ray laser at 13.9 nm. A main pumping pulse of 140 J in 100 ps (I8×1013Wcm2), the preceded 3 ns before by a prepulse of variable intensity was used to create the amplifying medium. The target length was varied up to 2 cm for the single target and 4 cm for the double target. For the double target the quasi-traveling-wave excitation (QTWE) technique has been used. Time-integrated as well as time-resolved measurement of the 4d4p J=01 line have been performed for different pumping configurations and target geometry. Due to the very high pumping intensity and the resulting plasma overheating, an exceptionally high-gain coefficient of 19cm1 has been measured leading to the saturation regime for plasma length longer than 8 mm. Time-resolved and time-integrated 3d4f spectra of the plasma are also displayed and ionization balance is discussed. Using double-target geometry a narrow divergence is observed due to efficient coupling factor as well as a temporal increase of the x-ray laser pulse duration in the direction of QTWE. The far-field pattern of the x-ray laser beam has been characterized. Two vertically separated bright spots were observed for the double target, while a single spot was observed for the single target. The energy of the double-target x-ray laser beam has been measured to be 300μJ which closely corresponds to an output power of 5 MW.

  • Received 9 November 1999

DOI:https://doi.org/10.1103/PhysRevA.61.043810

©2000 American Physical Society

Authors & Affiliations

S. Sebban1,*, H. Daido1, N. Sakaya1, Y. Kato1,†, K. Murai2, H. Tang3,‡, Y. Gu3, G. Huang3, S. Wang3, A. Klisnick4, Ph. Zeitoun4, F. Koike5, and H. Takenaka6

  • 1Institute of Laser Engineering, Osaka University, Suita, Osaka 565-0871, Japan
  • 2Osaka National Research Institute, Ikeda, Osaka 563-8577, Japan
  • 3National Laboratory for High Power Lasers and Physics, P.O. Box 800-211, Shanghai, China
  • 4Laboratoire de Spectroscopie Atomique et Ionique, Université Paris–Sud, 91405 Orsay, France
  • 5School of Medicine, Kitasato University, 1-15 Kitasato, Sagamihara, Kanagawa 228, Japan
  • 6NTT-AT, 3-9-11 Midorimachi, Musashino, Tokyo 180, Japan

  • *Present address: Laboratoire d’Optique Appliquée, Ecole Nationale de Techniques Avancées, Chemin de la Hunière, 91761 Palaiseau, France.
  • Present address: Advanced Photon Research Center, Kansai Research Establishment, Japan Atomic Energy Research Institute, 8-1 Umemidai, Kizu, Souraku, Kyoto 619-0215, Japan.
  • Present address: Institute of Laser Engineering, Osaka University, Suita, Osaka 565-0871, Japan.

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Vol. 61, Iss. 4 — April 2000

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