Structure, physical properties, and applications of SrRuO3 thin films

Gertjan Koster, Lior Klein, Wolter Siemons, Guus Rijnders, J. Steven Dodge, Chang-Beom Eom, Dave H. A. Blank, and Malcolm R. Beasley
Rev. Mod. Phys. 84, 253 – Published 8 March 2012

Abstract

SrRuO3 is endowed with three remarkable features. First, it is a moderately correlated material that exhibits several novel physical properties; second, it permits the epitaxial growth of essentially single-crystal films; and third, because it is a good conductor, it has attracted interest as a conducting layer in epitaxial heterostructures with a variety of functional oxides. In this review, the present state of knowledge of SrRuO3 thin films is summarized. Their role as a model system for studying magnetism and electron transport characterized by intermediate electron correlation and large magnetocrystalline anisotropy is demonstrated. The materials science of SrRuO3 thin film growth is reviewed, and its relationship to electronic, magnetic, and other physical properties is discussed. Finally, it is argued that, despite all that has been learned, a comprehensive understanding of SrRuO3 is still lacking and challenges remain.

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  • Received 21 April 2010

DOI:https://doi.org/10.1103/RevModPhys.84.253

© 2012 American Physical Society

Authors & Affiliations

Gertjan Koster*

  • Faculty of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, 7500 AE Enschede, The Netherlands

Lior Klein

  • Department of Physics, Nano-magnetism Research Center, Institute of Nanotechnology and Advanced Materials, Bar-Ilan University, Ramat-Gan 52900, Israel

Wolter Siemons

  • Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA

Guus Rijnders

  • Faculty of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, 7500 AE Enschede, The Netherlands

J. Steven Dodge

  • Department of Physics, Simon Fraser University, Burnaby, British Columbia, V5A 1S6, Canada

Chang-Beom Eom

  • Department of Materials Science and Engineering, University of Wisconsin–Madison, Madison, Wisconsin 53706, USA

Dave H. A. Blank

  • Faculty of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, 7500 AE Enschede, The Netherlands

Malcolm R. Beasley

  • Department of Applied Physics and the Geballe Laboratory for Advanced Materials, Stanford University, Stanford, California 94305, USA

  • *g.koster@utwente.nl

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Vol. 84, Iss. 1 — January - March 2012

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