• Open Access

Random Strain Fluctuations as Dominant Disorder Source for High-Quality On-Substrate Graphene Devices

Nuno J. G. Couto, Davide Costanzo, Stephan Engels, Dong-Keun Ki, Kenji Watanabe, Takashi Taniguchi, Christoph Stampfer, Francisco Guinea, and Alberto F. Morpurgo
Phys. Rev. X 4, 041019 – Published 30 October 2014

Abstract

We perform systematic investigations of transport through graphene on hexagonal boron nitride (hBN) substrates, together with confocal Raman measurements and a targeted theoretical analysis, to identify the dominant source of disorder in this system. Low-temperature transport measurements on many devices reveal a clear correlation between the carrier mobility μ and the width n* of the resistance peak around charge neutrality, demonstrating that charge scattering and density inhomogeneities originate from the same microscopic mechanism. The study of weak localization unambiguously shows that this mechanism is associated with a long-ranged disorder potential and provides clear indications that random pseudomagnetic fields due to strain are the dominant scattering source. Spatially resolved Raman spectroscopy measurements confirm the role of local strain fluctuations, since the linewidth of the Raman 2D peak—containing information of local strain fluctuations present in graphene—correlates with the value of maximum observed mobility. The importance of strain is corroborated by a theoretical analysis of the relation between μ and n* that shows how local strain fluctuations reproduce the experimental data at a quantitative level, with n* being determined by the scalar deformation potential and μ by the random pseudomagnetic field (consistently with the conclusion drawn from the analysis of weak localization). Throughout our study, we compare the behavior of devices on hBN substrates to that of devices on SiO2 and SrTiO3, and find that all conclusions drawn for the case of hBN are compatible with the observations made on these other materials. These observations suggest that random strain fluctuations are the dominant source of disorder for high-quality graphene on many different substrates, and not only on hexagonal boron nitride.

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  • Received 2 July 2014

DOI:https://doi.org/10.1103/PhysRevX.4.041019

This article is available under the terms of the Creative Commons Attribution 3.0 License. Further distribution of this work must maintain attribution to the author(s) and the published article’s title, journal citation, and DOI.

Published by the American Physical Society

Authors & Affiliations

Nuno J. G. Couto1, Davide Costanzo1, Stephan Engels2, Dong-Keun Ki1, Kenji Watanabe3, Takashi Taniguchi3, Christoph Stampfer2, Francisco Guinea5, and Alberto F. Morpurgo1,*

  • 1Département de Physique de la Matière Condensée (DPMC) and Group of Applied Physics (GAP), University of Geneva, 24 Quai Ernest-Ansermet 1211 Genève 4, Switzerland
  • 2JARA-FIT and 2nd Institute of Physics, RWTH Aachen University, 52074 Aachen, Germany and Peter Grünberg Institute (PGI-9), Forschungszentrum Jülich, 52425 Jülich, Germany
  • 3National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
  • 5Instituto de Ciencia de Materiales de Madrid, CSIC, Cantoblanco, E-28015 Madrid, Spain

  • *Corresponding author. Alberto.Morpurgo@unige.ch

Popular Summary

Graphene is a honeycomb lattice entirely made of carbon only one atom thick; it is the first system discovered to be a perfect two-dimensional crystal. However, even graphene, with all of its ideal properties, is unavoidably deformed when isolated and placed on a supporting substrate. For instance, graphene may not lie perfectly flat but instead form “bumps.” Furthermore, its atoms may be randomly displaced from their ideal positions in the honeycomb lattice because of the force exerted by the atoms in the substrate. Scientists call these types of mechanical deformations “strain.” We show that when graphene exfoliated from graphite is placed on a supporting hexagonal boron nitride substrate, the random strain that appears in the carbon honeycomb lattice reduces the speed with which electrons can move inside the material.

Scientists have puzzled for a long time about the mechanism limiting the speed of electrons in real-world graphene devices. Many possibilities have been proposed, such as missing atoms or chemical impurities, structural defects in the honeycomb lattice, and unintentional “dirt.” All of these mechanisms can play a role in limiting the speed of electrons, which is why the situation has remained unclear for a long time. We use both statistical analyses and experimental verification and provide ample evidence that random strain fluctuations in the material set a limit on the electron speed for temperatures as low as 250 mK. We find that electron scattering is local (i.e., within the same valley) and is due to long-range potentials. The way in which strain affects electrons in graphene is very similar to the effect of a magnetic field. In other words, random strain generates a fluctuating pseudomagnetic field, which randomly deflects electrons and limits their speed. Since the amount of strain can strongly depend on the substrate or on the way in which the graphene layer is mounted on the substrate, the electron speed or mobility can vary significantly. We find that our results can also be applied to graphene mounted on SiO2 and SrTiO3 substrates.

Future electronic applications will necessitate a high electron speed. To optimize applications, therefore, we will need to focus our efforts on selecting substrates and assembly procedures that minimize strain.

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Vol. 4, Iss. 4 — October - December 2014

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