Abstract
We report on the epitaxial growth of pyrochlore NRO thin films utilizing a reactive off-axis sputtering technique. The growth process employed Ru and Nd metal targets with a repetitive substrate temperature sequence. X-ray diffraction, magnetic susceptibility, and spectroscopic ellipsometry measurements confirm that the structural, magnetic, and electronic properties of near-stoichiometric NRO films match those of the bulk material. Our spin-polarized density functional calculations based on structural parameters accurately describe the optical spectra and assign Hubbard bands to the interband transitions observed above the optical band gap of 0.2 eV. By utilizing the technique's capability to adjust the degree of ruthenium deficiency, we investigated films across a wide range of stoichiometric variations. Decreasing the Ru/Nd ratio results in lattice expansion, an increase in the optical band gap, and the suppression of Ru intersite optical transitions. Additionally, this adjustment facilitates the elimination of minor inclusions of a ferromagnetic impurity phase, influencing the magnetic properties of stoichiometric films at low temperatures. The successful growth of films opens up promising opportunities for designing and exploring strain- and light-induced states in pyrochlore ruthenates.
- Received 20 December 2023
- Accepted 15 April 2024
DOI:https://doi.org/10.1103/PhysRevMaterials.8.053801
Published by the American Physical Society under the terms of the Creative Commons Attribution 4.0 International license. Further distribution of this work must maintain attribution to the author(s) and the published article's title, journal citation, and DOI. Open access publication funded by Max Planck Society.
Published by the American Physical Society