• Open Access

Realization of chiral multifold semimetal RhSi crystalline thin films

Hua Lv, Edouard Lesne, Rebeca Ibarra, Yan Sun, Anastasios Markou, and Claudia Felser
Phys. Rev. Materials 7, 054201 – Published 26 May 2023

Abstract

Nonmagnetic topological semimetals that combine chirality in real and momentum spaces host unconventional multifold fermions and exhibit exotic electronic and optical properties endowed by their topologically nontrivial electronic band structure. Although the synthesis of nonmagnetic chiral single crystals with a noncentrosymmetric cubic B20 structure is well established, their heteroepitaxial growth in crystalline thin films remains a notable challenge. In this study, we present the structural, magnetic, and electrical magnetotransport properties of 24- and 51-nm-thick films of a B20-RhSi stoichiometric compound grown by magnetron sputtering. RhSi crystalline thin films on Si (111) single-crystal substrates exhibit a preferred (111) orientation with twin domains. The RhSi films display a nonmagnetic ground state, and their electrical resistivity demonstrates a clear and nonsaturating metallic behavior from 300 to 5 K. Magnetotransport measurements reveal that hole-type carriers dominate the Hall response with multiband contributions to electronic transport in the system. The good agreement with the Bloch-Grüneisen model and our first-principles calculations confirms that temperature-dependent electrical resistivity is governed by electron-phonon scattering. The ability to grow textured-epitaxial thin films of nonmagnetic B20 chiral topological semimetals is an important step toward accessing and controlling their remarkable topological surface states for designing chiraltronic devices with novel optoelectronic or spintronic functionalities.

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  • Received 4 January 2023
  • Accepted 5 May 2023

DOI:https://doi.org/10.1103/PhysRevMaterials.7.054201

Published by the American Physical Society under the terms of the Creative Commons Attribution 4.0 International license. Further distribution of this work must maintain attribution to the author(s) and the published article's title, journal citation, and DOI. Open access publication funded by the Max Planck Society.

Published by the American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Hua Lv1,*,†, Edouard Lesne1,*,‡, Rebeca Ibarra1, Yan Sun2, Anastasios Markou1,3,§, and Claudia Felser1,**

  • 1Max Planck Institute for Chemical Physics of Solids, Nöthnitzer Str. 40, 01187 Dresden, Germany
  • 2Institute of Metal Research, Chinese Academy of Science, Shenyang, China
  • 3Physics Department, University of Ioannina, 45110 Ioannina, Greece

  • *These authors contributed equally to this work.
  • Present address: Paul-Drude-Institut für Festkörperelektronik, Leibniz-Instiut im Forschungsverbund Berlin e.V., Hausvogteiplatz 5-7, 10117 Berlin, Germany.
  • Corresponding author: Edouard.Lesne@cpfs.mpg.de
  • §Corresponding author: Anastasios.Markou@cpfs.mpg.de
  • **Corresponding author: Claudia.Felser@cpfs.mpg.de

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Issue

Vol. 7, Iss. 5 — May 2023

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