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Probing antiferromagnetic coupling in magnetic insulator/metal heterostructures

Patrick Quarterman, Yabin Fan, Zhijie Chen, Christopher J. Jensen, Rajesh V. Chopdekar, Dustin A. Gilbert, Megan E. Holtz, Mark D. Stiles, Julie A. Borchers, Kai Liu, Luqiao Liu, and Alexander J. Grutter
Phys. Rev. Materials 6, 094418 – Published 30 September 2022
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Abstract

Using depth- and element-resolved characterization, we report insights into antiferromagnetic coupling in Y3Fe5O12/permalloy (YIG/Py) and Y3Fe5O12/Co (YIG/Co) thin-film heterostructures grown on Si/SiO2 and Gd3Ga5O12 substrates. We build on recent work demonstrating antiferromagnetic coupling in polycrystalline YIG/metallic-ferromagnetic systems by characterizing differences in the structural and magnetic properties which depend on the choice of ferromagnet (Py vs Co), seed layer (with and without Pt), and substrate (Si/SiO2 vs Gd3Ga5O12). These differences in the sample structure manifest as notable changes in interface coupling sign, magnetic reversal mechanisms, magnetic depth profiles, and domain structure. Through a combination of magnetometry, polarized neutron reflectometry, and x-ray photoemission electron microscopy, a comprehensive picture of the magnetic interactions is realized, with lateral- and depth resolution at submicrometer and nanometer scales, respectively. These results confirm that both Co and Py share a preference to align antiparallel to polycrystalline YIG grown on some substrates (Si/SiO2 and Si/SiO2/Pt), while coupling ferromagnetically with highly oriented YIG on (111) Gd3Ga5O12 and (110) Gd3Ga5O12/Pt substrates. The complex interplay among magnetic interactions at the YIG/ferromagnetic interface has important implications for spintronic and magnonic devices based on this platform.

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  • Received 4 May 2022
  • Revised 24 June 2022
  • Accepted 31 August 2022

DOI:https://doi.org/10.1103/PhysRevMaterials.6.094418

©2022 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Patrick Quarterman1,*, Yabin Fan2, Zhijie Chen3, Christopher J. Jensen3, Rajesh V. Chopdekar4, Dustin A. Gilbert5, Megan E. Holtz6,7, Mark D. Stiles8, Julie A. Borchers1, Kai Liu3, Luqiao Liu2, and Alexander J. Grutter1,†

  • 1NIST Center for Neutron Research, National Institute of Standards and Technology, 100 Bureau Dr., Gaithersburg, Maryland 20899, USA
  • 2Microsystems Technology Laboratories, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA
  • 3Physics Department, Georgetown University, Washington, DC 20057, USA
  • 4Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
  • 5Department of Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996, USA
  • 6Materials Measurement Laboratory, National Institute of Standards and Technology, 100 Bureau Dr., Gaithersburg, Maryland 20899, USA
  • 7Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, Colorado 80401, USA
  • 8Center for Nanoscale Science and Technology, National Institute of Standards and Technology, 100 Bureau Dr., Gaithersburg, Maryland 20899, USA

  • *patrick.quarterman@gmail.com
  • alexander.grutter@nist.gov

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Issue

Vol. 6, Iss. 9 — September 2022

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