Origin of hydrogen passivation in 4H-SiC

Xuefen Cai, Yang Yang, Hui-Xiong Deng, and Su-Huai Wei
Phys. Rev. Materials 5, 064604 – Published 22 June 2021
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Abstract

Carbon vacancy VC is the dominant detrimental defect in SiC, and hydrogen passivation of VC is often used to facilitate its application in electronic devices. However, the exact nature of hydrogen passivation of VC in 4H-SiC remains inconclusive in view of the available divergent experiment and theoretical findings. Here, using the Heyd-Scuseria-Ernzerhof screened hybrid density functional calculations, we demonstrate that the VC defect can capture up to four hydrogens, and the electrically active levels within the band gap can be entirely passivated, in line with recent reported experimental observations. This paper, thus, casts light on the role of hydrogen passivation in SiC.

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  • Received 1 March 2021
  • Accepted 9 June 2021

DOI:https://doi.org/10.1103/PhysRevMaterials.5.064604

©2021 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Xuefen Cai1, Yang Yang1, Hui-Xiong Deng2,*, and Su-Huai Wei1,†

  • 1Beijing Computational Science Research Center, Beijing 100094, China
  • 2State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China

  • *hxdeng@semi.ac.cn
  • Corresponding author: suhuaiwei@csrc.ac.cn

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Issue

Vol. 5, Iss. 6 — June 2021

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