Interface roughness governed negative magnetoresistances in two-dimensional electron gases in AlGaN/GaN heterostructures

Ting-Ting Wang, Sining Dong, Zhi-Li Xiao, Chong Li, Wen-Cheng Yue, Bin-Xi Liang, Fei-Fan Xu, Yong-Lei Wang, Sheng-Rui Xu, Xiao-Li Lu, Jianhua Li, Chenguang Wang, Zixiong Yuan, Song-Lin Li, Guo-Zhu Sun, Bin Liu, Hai Lu, Hua-Bing Wang, and Wai-Kwong Kwok
Phys. Rev. Materials 5, 064003 – Published 10 June 2021
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Abstract

Negative magnetoresistances (NMRs) have been widely observed in two-dimensional electron gases (2DEGs). However, their origins are under debate. Here, we report on NMRs in the 2DEG in AlGaN/GaN heterostructures, aiming to uncover their origins by utilizing electric field gating. We systematically measured the magnetoresistances in magnetic fields up to 12 T and at temperatures between 3 and 260 K and observed NMRs over a wide range of temperatures from 3 to 170 K, which become more pronounced with decreasing temperature. We conducted electric field gating experiments to correlate the occurrence of NMRs with the relationship between electron mobility and density. The latter is governed by defect scattering sources in the sample and can be theoretically modeled. Comparison of the measured electron mobility and electron density relationship with theory reveals that interface roughness scattering plays a crucial role in obtaining large NMRs. Our work demonstrates that electric field gating provides a means not only to tune the values of NMRs but also to uncover their mechanisms.

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  • Received 3 March 2021
  • Revised 5 May 2021
  • Accepted 27 May 2021

DOI:https://doi.org/10.1103/PhysRevMaterials.5.064003

©2021 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Ting-Ting Wang1, Sining Dong1, Zhi-Li Xiao2,3,*, Chong Li1, Wen-Cheng Yue1, Bin-Xi Liang1, Fei-Fan Xu1, Yong-Lei Wang1,†, Sheng-Rui Xu4, Xiao-Li Lu4,‡, Jianhua Li1, Chenguang Wang1, Zixiong Yuan1, Song-Lin Li1, Guo-Zhu Sun1,5, Bin Liu1, Hai Lu1, Hua-Bing Wang1,5, and Wai-Kwong Kwok2

  • 1School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, China
  • 2Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA
  • 3Department of Physics, Northern Illinois University, DeKalb, Illinois 60115, USA
  • 4School of Microelectronics & State Key Discipline Laboratory of Wide Bandgap Semiconductor Technology, Xidian University, Xi'an 710071, China
  • 5Purple Mountain Laboratories, Nanjing 211111, China

  • *xiao@anl.gov
  • yongleiwang@nju.edu.cn
  • xllu@xidian.edu.cn

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Issue

Vol. 5, Iss. 6 — June 2021

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