Stabilization of phase-pure rhombohedral HfZrO4 in pulsed laser deposited thin films

Laura Bégon-Lours, Martijn Mulder, Pavan Nukala, Sytze de Graaf, Yorick A. Birkhölzer, Bart Kooi, Beatriz Noheda, Gertjan Koster, and Guus Rijnders
Phys. Rev. Materials 4, 043401 – Published 7 April 2020
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Abstract

Controlling the crystalline structure of hafnium zirconate and its epitaxial relationship to a semiconducting electrode has high technological interest, as ferroelectric materials are key ingredients for emerging electronic devices. Using pulsed laser deposition, a phase-pure, ultrathin film of HfZrO4 is grown epitaxially on a GaN(0001)/Si(111) template. Since standard microscopy techniques do not allow us to determine with certitude the crystalline structure of the film due to the weak scattering of oxygen, differentiated differential phase contrast scanning transmission electron microscopy is used to allow the direct imaging of oxygen columns in the film. Combined with x-ray diffraction analysis, the polar nature and rhombohedral R3 symmetry of the film are demonstrated.

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  • Received 11 December 2019
  • Accepted 6 March 2020

DOI:https://doi.org/10.1103/PhysRevMaterials.4.043401

©2020 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Laura Bégon-Lours1,*, Martijn Mulder1, Pavan Nukala2, Sytze de Graaf2, Yorick A. Birkhölzer1, Bart Kooi2, Beatriz Noheda2, Gertjan Koster1, and Guus Rijnders1

  • 1Inorganic Materials Science, University of Twente, 7500 AE, Netherlands
  • 2Zernike Institute of Advanced Materials, University of Groningen, 9747 AG, Netherlands

  • *l.c.y.begon-lours@utwente.nl

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Issue

Vol. 4, Iss. 4 — April 2020

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