Mechanism of Shear-Induced Alignment in Bilayer Thin Films of Spherical Particles

Jörg Rottler and David J. Srolovitz
Phys. Rev. Lett. 98, 175503 – Published 26 April 2007

Abstract

The phenomenon of shear-induced alignment in polycrystalline bilayer systems is analyzed using Brownian dynamics simulations. We show that the alignment process can be explained in terms of a local grain boundary migration mechanism. Both microscopic and continuum models are constructed that predict the boundary migration velocity as a function of local structure and shear stress. In the continuum picture, shear-induced potential energy gradients act as the driving force for migration, and the grain boundary mobility is sensitive to the degree of misorientation between the grains.

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  • Received 7 November 2006

DOI:https://doi.org/10.1103/PhysRevLett.98.175503

©2007 American Physical Society

Authors & Affiliations

Jörg Rottler1 and David J. Srolovitz2

  • 1Department of Physics and Astronomy, University of British Columbia, 6224 Agricultural Road, Vancouver, BC V6T 1Z1, Canada
  • 2Department of Physics, Yeshiva University, New York, New York 10033, USA

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Issue

Vol. 98, Iss. 17 — 27 April 2007

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