Emission-Depth-Selective Auger Photoelectron Coincidence Spectroscopy

Wolfgang S. M. Werner, Werner Smekal, Herbert Störi, Hannspeter Winter, Giovanni Stefani, Alessandro Ruocco, Francesco Offi, Roberto Gotter, Alberto Morgante, and Fernando Tommasini
Phys. Rev. Lett. 94, 038302 – Published 27 January 2005

Abstract

The collision statistics of the energy dissipation of Auger and photoelectrons emitted from an amorphized Si(100) surface is studied by measuring the Si 2p photoelectron line as well as the first plasmon loss peak in coincidence with the Si-LVV Auger transition and the associated first plasmon loss. The Si 2p plasmon intensity decreases when measured in coincidence with the Si-LVV peak. If measured in coincidence with the Si-LVV plasmon the decrease is significantly smaller. The results agree quantitatively with calculations accounting for surface, volume, and intrinsic losses as well as elastic scattering in a random medium. In this way one can determine the average emission depth of individual electrons by means of Auger photoelectron coincidence spectroscopy, which therefore constitutes a unique tool to investigate interfaces at the nanoscale level.

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  • Received 26 July 2004

DOI:https://doi.org/10.1103/PhysRevLett.94.038302

©2005 American Physical Society

Authors & Affiliations

Wolfgang S. M. Werner, Werner Smekal, Herbert Störi, and Hannspeter Winter

  • Institut für Allgemeine Physik, Vienna University of Technology, Wiedner Hauptstraße 8-10, A-1040 Vienna, Austria

Giovanni Stefani, Alessandro Ruocco, and Francesco Offi

  • Dipartimento di Fisica and Unità INFM, Università di Roma Tre, via della Vasca Navale 84, I-00146 Rome, Italy

Roberto Gotter1, Alberto Morgante1,2, and Fernando Tommasini1,2

  • 1Laboratorio Nazionale TASC-INFM, Area Science Park, SS14 km 163.5, I-34012 Trieste, Italy
  • 2Dipartimento di Fisica, Università di Trieste, via Valerio 2, I-34127 Trieste, Italy

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Issue

Vol. 94, Iss. 3 — 28 January 2005

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