Abstract
We report the realization of a new mult-band-gap semiconductor. alloys have been synthesized using the combination of oxygen ion implantation and pulsed laser melting. Incorporation of small quantities of isovalent oxygen leads to the formation of a narrow, oxygen-derived band of extended states located within the band gap of the host. When only 1.3% of Te atoms are replaced with oxygen in a crystal the resulting band structure consists of two direct band gaps with interband transitions at and 2.7 eV. This remarkable modification of the band structure is well described by the band anticrossing model. With multiple band gaps that fall within the solar energy spectrum, is a material perfectly satisfying the conditions for single-junction photovoltaics with the potential for power conversion efficiencies surpassing 50%.
- Received 24 July 2003
DOI:https://doi.org/10.1103/PhysRevLett.91.246403
©2003 American Physical Society