Magnetostrictive Domain Walls in Antiferromagnetic NiO

N. B. Weber, H. Ohldag, H. Gomonaj, and F. U. Hillebrecht
Phys. Rev. Lett. 91, 237205 – Published 5 December 2003

Abstract

We report high-resolution observations of antiferromagnetic (AF) domain walls at the surface of NiO and determine the typical width of AF walls in this material to be of the order of 150 nm. We observe a number of different types of domain walls, including double walls caused by long-range interaction between walls. We describe the observed wall profiles by a model containing the exchange interaction and magnetostriction as basic ingredients. The good agreement of this model with experiment shows that the formation of walls between antiferromagnetic domains in NiO and their properties are dominated by magnetoelastic interactions.

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  • Received 16 October 2002

DOI:https://doi.org/10.1103/PhysRevLett.91.237205

©2003 American Physical Society

Authors & Affiliations

N. B. Weber and H. Ohldag*

  • Institut für Angewandte Physik, Heinrich-Heine-Universität Düsseldorf, 40225 Düsseldorf, Germany

H. Gomonaj and F. U. Hillebrecht

  • Max-Planck-Institut für Mikrostrukturphysik, Weinberg 2, 06120, Halle, Germany

  • *Present addresses: Stanford Synchrotron Radiation Laboratory, P.O. Box 20450, Stanford, CA 94309, USA; Advanced Light Source, Lawrence Berkeley National Laboratory, One Cyclotron Road, Berkeley, CA 94720, USA.
  • Permanent address: National Technical University “KPI,“ ave Peremogy, 37, 03056 Kyiv, Ukraine. Email address: malyshen@ukrpack.net
  • Present address: Institut für Festköperphysik, Forschungszentrum Karlsruhe, P.O. Box 3640, 76021 Karlsruhe, Germany. Email address: Ulrich.Hillebrecht@ifp.fzk.de

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Issue

Vol. 91, Iss. 23 — 5 December 2003

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