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Abrasive Wear on the Atomic Scale

E. Gnecco, R. Bennewitz, and E. Meyer
Phys. Rev. Lett. 88, 215501 – Published 8 May 2002
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Abstract

A scanning force microscope in ultrahigh vacuum has been used to realize and detect atomic-scale abrasion on KBr(001). The continuous time evolution of the lateral force under scratching reveals that the wear mechanism is due to the removal and the rearrangement of single ion pairs. The debris is reorganized in regular terraces with the same periodicity and orientation as the unscratched surface, as in local epitaxial growth. The applied load has a strong influence on the abrasive process, whereas the scan velocity is less relevant.

  • Received 8 January 2002

DOI:https://doi.org/10.1103/PhysRevLett.88.215501

©2002 American Physical Society

Authors & Affiliations

E. Gnecco, R. Bennewitz, and E. Meyer

  • Institute of Physics, University of Basel, Klingelbergstrasse 82, CH-4056 Basel, Switzerland

See Also

The Perfect Rake

R. Mark Wilson
Phys. Rev. Focus 9, 26 (2002)

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Vol. 88, Iss. 21 — 27 May 2002

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