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Atom Lithography with a Holographic Light Mask

M. Mützel, S. Tandler, D. Haubrich, D. Meschede, K. Peithmann, M. Flaspöhler, and K. Buse
Phys. Rev. Lett. 88, 083601 – Published 7 February 2002
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Abstract

In atom lithography with optical masks, deposition of an atomic beam on a given substrate is controlled by a standing light-wave field. The lateral intensity distribution of the light field is transferred to the substrate with nanometer scale. We have tailored a complex pattern of this intensity distribution through diffraction of a laser beam from a hologram that is stored in a photorefractive crystal. This method can be extended to superpose 1000 or more laser beams. The method is furthermore applicable during growth processes and thus allows full 3D structuring of suitable materials with periodic and nonperiodic patterns at nanometer scales.

  • Received 11 September 2001

DOI:https://doi.org/10.1103/PhysRevLett.88.083601

©2002 American Physical Society

Authors & Affiliations

M. Mützel, S. Tandler, D. Haubrich, and D. Meschede

  • Institut für Angewandte Physik, Universität Bonn, Wegelerstrasse 8, D-53115 Bonn, Germany

K. Peithmann*, M. Flaspöhler, and K. Buse

  • Universität Osnabrück, Fachbereich Physik, Barbarastrasse 7, D-49069 Osnabrück, Germany

  • *Present address: Physikalisches Institut, Universität Bonn, Wegelerstrasse 8, D-53115 Bonn, Germany
  • Present address: Physikalisches Institut, Universität Bonn, Wegelerstrasse 8, D-53115 Bonn, Germany

See Also

Guiding Atoms with a Hologram

JR Minkel
Phys. Rev. Focus 9, 10 (2002)

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Vol. 88, Iss. 8 — 25 February 2002

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