Dephasing Rate in Dielectric Glasses at Ultralow Temperatures

A. L. Burin, Yu. Kagan, L. A. Maksimov, and I. Ya. Polishchuk
Phys. Rev. Lett. 80, 2945 – Published 30 March 1998; Erratum Phys. Rev. Lett. 81, 2395 (1998)
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Abstract

A novel mechanism for dephasing in dielectric glasses is considered. The mechanism is due to the delocalized collective excitations arising in the ensemble of the interacting two-level systems. The spectral diffusion induced by these excitations gives rise to the phonon-independent transverse relaxation. The mechanism results in the linear temperature dependence of the dephasing rate and becomes predominant at ultralow temperatures. A qualitative agreement with the experimental data is found.

  • Received 6 January 1997

DOI:https://doi.org/10.1103/PhysRevLett.80.2945

©1998 American Physical Society

Erratum

Erratum: Dephasing Rate in Dielectric Glasses at Ultralow Temperatures [Phys. Rev. Lett. 80, 2945 (1998)]

A. L. Burin, Yu. Kagan, L. A. Maksimov, and I. Ya. Polishchuk
Phys. Rev. Lett. 81, 2395 (1998)

Authors & Affiliations

A. L. Burin1,2, Yu. Kagan2, L. A. Maksimov2, and I. Ya. Polishchuk2

  • 1Department of Chemistry, Northwestern University, 1918 Sheridan Road, Evanston, Illinois 60208
  • 2RRC Kurchatov Institute, 123182 Moscow, Russia

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Vol. 80, Iss. 13 — 30 March 1998

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