Step Faceting at the (001) Surface of Boron Doped Silicon

J. B. Hannon, N. C. Bartelt, B. S. Swartzentruber, J. C. Hamilton, and G. L. Kellogg
Phys. Rev. Lett. 79, 4226 – Published 24 November 1997
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Abstract

We have used low energy electron microscopy to study the energetics of steps on the (001) surface of heavily boron doped Si. When the surface is cooled below 980 °C, the SB step restructures dramatically, assuming a sawtooth profile consisting of triangular facets. The apex angle of the facets is strongly temperature dependent. By quantitative analysis of thermal step fluctuations and 2D island shapes we show that the free energy of isolated SA steps decreases sharply as the temperature is lowered. Using the Wulff construction, we demonstrate that the observed faceting is a direct consequence of the vanishing SA step free energy.

  • Received 11 June 1997

DOI:https://doi.org/10.1103/PhysRevLett.79.4226

©1997 American Physical Society

Authors & Affiliations

J. B. Hannon1, N. C. Bartelt2, B. S. Swartzentruber1, J. C. Hamilton2, and G. L. Kellogg1

  • 1Sandia National Laboratories, Albuquerque, New Mexico 87185
  • 2Sandia National Laboratories, Livermore, California 94551

Comments & Replies

Hannon et al. Reply:

J. B. Hannon, N. C. Bartelt, B. S. Swartzentruber, J. C. Hamilton, and G. L. Kellogg
Phys. Rev. Lett. 81, 5474 (1998)

Comment on “Step Faceting at the (001) Surface of Boron Doped Silicon”

J. P. Pelz, C. Ebner, D. E. Jones, Y. Hong, E. Bauer, and I. S. T. Tsong
Phys. Rev. Lett. 81, 5473 (1998)

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Vol. 79, Iss. 21 — 24 November 1997

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