Dimer and String Formation during Low Temperature Silicon Deposition on Si(100)

A. P. Smith and H. Jónsson
Phys. Rev. Lett. 77, 1326 – Published 12 August 1996
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Abstract

We present theoretical results based on density functional theory and kinetic Monte Carlo simulations of silicon deposition and address observations made in recently reported low temperature scanning tunneling microscopy studies. A mechanism is presented which explains dimer formation on top of the substrate's dimer rows at 160 K and up to room temperature, while between-row dimers and longer strings of adatoms (“diluted dimer rows”) form at higher temperature. A crossover occurs at around room temperature between two different mechanisms for adatom diffusion in our model.

  • Received 13 March 1996

DOI:https://doi.org/10.1103/PhysRevLett.77.1326

©1996 American Physical Society

Authors & Affiliations

A. P. Smith1 and H. Jónsson1,2

  • 1Department of Chemistry, University of Washington, Box 351700, Seattle, Washington 98195-1700
  • 2Center for Atomic-Scale Materials Physics, Department of Physics, Technical University of Denmark, DK-2800 Lyngby, Denmark

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Vol. 77, Iss. 7 — 12 August 1996

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