Abstract
Sputtering of thick films of solid deuterium up to several μm by keV electrons is reported for the first time. The sputtering yield increases within a narrow range of thicknesses around 1.6 μm by about 2 orders of magnitude for 1.5 keV electrons. A similar behavior has not been observed for ion bombardment. The yield enhancement is accompanied by an increasing electron accumulation in the film.
- Received 9 May 1994
DOI:https://doi.org/10.1103/PhysRevLett.73.1444
©1994 American Physical Society