Sputtering of Thick Deuterium Films by KeV Electrons

Birgitte Thestrup, Winnie Svendsen, Jørgen Schou, and Ole Ellegaard
Phys. Rev. Lett. 73, 1444 – Published 5 September 1994
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Abstract

Sputtering of thick films of solid deuterium up to several μm by keV electrons is reported for the first time. The sputtering yield increases within a narrow range of thicknesses around 1.6 μm by about 2 orders of magnitude for 1.5 keV electrons. A similar behavior has not been observed for ion bombardment. The yield enhancement is accompanied by an increasing electron accumulation in the film.

  • Received 9 May 1994

DOI:https://doi.org/10.1103/PhysRevLett.73.1444

©1994 American Physical Society

Authors & Affiliations

Birgitte Thestrup, Winnie Svendsen, Jørgen Schou, and Ole Ellegaard*

  • Department of Optics and Fluid Dynamics, Risø National Laboratory, DK-4000 Roskilde, Denmark

  • *Present address: Odense University Library, Odense University, DK-5230 Odense M, Denmark.

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Vol. 73, Iss. 10 — 5 September 1994

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