Defect chemical potential and the density of states in amorphous silicon

S. C. Deane and M. J. Powell
Phys. Rev. Lett. 70, 1654 – Published 15 March 1993
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Abstract

We derive a general expression for the defect chemical potential of amphoteric silicon dangling bond states in amorphous silicon. We show that a single expression is valid, irrespective of the charge state of the dangling bond. We apply this result in a defect pool model for the formation of dangling bonds by the breaking of weak silicon-silicon bonds, with and without hydrogen motion. We calculate the resulting energy dependent density of states.

  • Received 11 December 1992

DOI:https://doi.org/10.1103/PhysRevLett.70.1654

©1993 American Physical Society

Authors & Affiliations

S. C. Deane and M. J. Powell

  • Philips Research Laboratories, Redhill, Surrey, RH1 5HA, United Kingdom

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Vol. 70, Iss. 11 — 15 March 1993

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