Phys. Rev. Lett. 69, 1475 (1992) - First-Principles-Derived Dynamics of a Surface Reaction: Fluorine Etching of Si(100)

First-Principles-Derived Dynamics of a Surface Reaction: Fluorine Etching of Si(100)

Paul C. Weakliem, Christine J. Wu, and Emily A. Carter

Phys. Rev. Lett. 69, 1475 – Published 31 August 1992

Abstract

DOI:https://doi.org/10.1103/PhysRevLett.69.1475

©1992 American Physical Society

Authors & Affiliations

Paul C. Weakliem, Christine J. Wu, and Emily A. Carter

Original Article

First-principles-derived dynamics of a surface reaction: Fluorine etching of Si(100)

Paul C. Weakliem, Christine J. Wu, and Emily A. Carter

Phys. Rev. Lett. 69, 200 (1992)

Issue

Vol. 69, Iss. 9 — 31 August 1992

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