Kinetic Process of Plasma Heating Due to Alfvén Wave Excitation

Akira Hasegawa and Lui Chen
Phys. Rev. Lett. 35, 370 – Published 11 August 1975
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Abstract

We elucidate the kinetic process of plasma heating by the resonant excitation of the shear Alfvén wave. The heating occurs as a result of the damping of the modified (by the finite ion Larmor radius and electron inertia) Alfvén wave which is excited by mode conversion at the resonant layer. The heating rates of ions and of electrons are comparable in the collisional regime; otherwise electrons are predominantly heated.

  • Received 4 September 1974

DOI:https://doi.org/10.1103/PhysRevLett.35.370

©1975 American Physical Society

Authors & Affiliations

Akira Hasegawa and Lui Chen*

  • Bell Laboratories, Murray Hill, New Jersey 07974

  • *Present address: Plasma Physics Laboratory, Princeton University, Princeton, N. J. 08540.

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Vol. 35, Iss. 6 — 11 August 1975

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