Intrinsic Origin of Enhancement of Ferroelectricity in SnTe Ultrathin Films

Kai Liu, Jinlian Lu, Silvia Picozzi, Laurent Bellaiche, and Hongjun Xiang
Phys. Rev. Lett. 121, 027601 – Published 9 July 2018
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Abstract

Previous studies showed that, as ferroelectric films become thinner, their Curie temperature (Tc) and polarization below Tc both typically decrease. In contrast, a recent experiment [Chang et al., Science 353, 274 (2016)] observed that atomic-thick SnTe films have a higher Tc than their bulk counterpart, which was attributed to extrinsic effects. We find, using first-principles calculations, that the 0-K energy barrier for the polarization switching (which is a quantity directly related to Tc) is higher in most investigated defect-free SnTe ultrathin films than that in bulk SnTe, and that the 5-unit-cell (UC) SnTe thin film has the largest energy barrier as a result of an interplay between hybridization interactions and Pauli repulsions. Further simulations, employing a presently developed effective Hamiltonian, confirm that freestanding, defect-free SnTe thin films have a higher Tc than bulk SnTe, except for the 1-UC case. Our work, therefore, demonstrates the possibility to intrinsically enhance ferroelectricity of ultrathin films by reducing their thickness.

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  • Received 4 December 2017

DOI:https://doi.org/10.1103/PhysRevLett.121.027601

© 2018 American Physical Society

Physics Subject Headings (PhySH)

  1. Research Areas
  1. Physical Systems
Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Kai Liu1,2, Jinlian Lu1,2, Silvia Picozzi3, Laurent Bellaiche4,*, and Hongjun Xiang1,2,†

  • 1Key Laboratory of Computational Physical Sciences (Ministry of Education), State Key Laboratory of Surface Physics, and Department of Physics, Fudan University, Shanghai 200433, People’s Republic of China
  • 2Collaborative Innovation Center of Advanced Microstructures, Nanjing 210093, People’s Republic of China
  • 3Consiglio Nazionale delle Ricerche, CNR-SPIN, Via dei Vestini 31, Chieti 66100, Italy
  • 4Physics Department and Institute for Nanoscience and Engineering, University of Arkansas, Fayetteville, Arkansas 72701, USA

  • *laurent@uark.edu
  • hxiang@fudan.edu.cn

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Issue

Vol. 121, Iss. 2 — 13 July 2018

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