Abstract
First-principles calculations of the dielectric anisotropy of the interface are compared to the anisotropy extracted from reflectance measurements on GaP thin films on Si(001) [O. Supplie et al., Phys. Rev. B 86, 035308 (2012)]. Optical excitations from two states localized in several Si layers adjacent to the interface result in the observed anisotropy of the interface. The calculations show excellent agreement with experiment only for a gapped interface with a P layer in contact with Si and show that a combination of theory and experiment can reveal localized electronic states and the atomic structure at buried interfaces.
- Received 15 February 2017
DOI:https://doi.org/10.1103/PhysRevLett.118.237403
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