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Picosecond Electric-Field-Induced Threshold Switching in Phase-Change Materials

Peter Zalden, Michael J. Shu, Frank Chen, Xiaoxi Wu, Yi Zhu, Haidan Wen, Scott Johnston, Zhi-Xun Shen, Patrick Landreman, Mark Brongersma, Scott W. Fong, H.-S. Philip Wong, Meng-Ju Sher, Peter Jost, Matthias Kaes, Martin Salinga, Alexander von Hoegen, Matthias Wuttig, and Aaron M. Lindenberg
Phys. Rev. Lett. 117, 067601 – Published 5 August 2016
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Abstract

Many chalcogenide glasses undergo a breakdown in electronic resistance above a critical field strength. Known as threshold switching, this mechanism enables field-induced crystallization in emerging phase-change memory. Purely electronic as well as crystal nucleation assisted models have been employed to explain the electronic breakdown. Here, picosecond electric pulses are used to excite amorphous Ag4In3Sb67Te26. Field-dependent reversible changes in conductivity and pulse-driven crystallization are observed. The present results show that threshold switching can take place within the electric pulse on subpicosecond time scales—faster than crystals can nucleate. This supports purely electronic models of threshold switching and reveals potential applications as an ultrafast electronic switch.

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  • Received 12 February 2016

DOI:https://doi.org/10.1103/PhysRevLett.117.067601

© 2016 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Synopsis

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Ultrafast Switching in a Phase-Change Material

Published 5 August 2016

New experiments show that picosecond pulses of light can effectively switch off the resistance in phase-change materials that are used for storing computer information.

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Authors & Affiliations

Peter Zalden1,2,*, Michael J. Shu1,3, Frank Chen1,4, Xiaoxi Wu1, Yi Zhu5, Haidan Wen5, Scott Johnston3, Zhi-Xun Shen3, Patrick Landreman8, Mark Brongersma8, Scott W. Fong4, H.-S. Philip Wong4, Meng-Ju Sher8, Peter Jost6, Matthias Kaes6, Martin Salinga6, Alexander von Hoegen6, Matthias Wuttig6,7, and Aaron M. Lindenberg1,2,8,†

  • 1Stanford Institute for Materials and Energy Sciences, SLAC National Accelerator Laboratory, Menlo Park, California 94025, USA
  • 2PULSE Institute, SLAC National Accelerator Laboratory, Menlo Park, California 94025, USA
  • 3Department of Applied Physics, Stanford University, Stanford, California 94305, USA
  • 4Department of Electrical Engineering, Stanford University, Stanford, California 94305, USA
  • 5Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA
  • 6I. Physikalisches Institut (IA), RWTH Aachen University, 52056 Aachen, Germany
  • 7JARA - Fundamentals of Information Technology, RWTH Aachen University, 52056 Aachen, Germany
  • 8Department of Materials Science and Engineering, Stanford University, Stanford, California 94305, USA

  • *Corresponding author. peter@zalden.de Present address: European XFEL, Holzkoppel 4, 22869 Schenefeld, Germany.
  • Corresponding author. aaronl@stanford.edu

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Issue

Vol. 117, Iss. 6 — 5 August 2016

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