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Phonon-Assisted Resonant Tunneling of Electrons in Graphene–Boron Nitride Transistors

E. E. Vdovin, A. Mishchenko, M. T. Greenaway, M. J. Zhu, D. Ghazaryan, A. Misra, Y. Cao, S. V. Morozov, O. Makarovsky, T. M. Fromhold, A. Patanè, G. J. Slotman, M. I. Katsnelson, A. K. Geim, K. S. Novoselov, and L. Eaves
Phys. Rev. Lett. 116, 186603 – Published 5 May 2016

Abstract

We observe a series of sharp resonant features in the differential conductance of graphene-hexagonal boron nitride-graphene tunnel transistors over a wide range of bias voltages between 10 and 200 mV. We attribute them to electron tunneling assisted by the emission of phonons of well-defined energy. The bias voltages at which they occur are insensitive to the applied gate voltage and hence independent of the carrier densities in the graphene electrodes, so plasmonic effects can be ruled out. The phonon energies corresponding to the resonances are compared with the lattice dispersion curves of graphene–boron nitride heterostructures and are close to peaks in the single phonon density of states.

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  • Received 8 December 2015

DOI:https://doi.org/10.1103/PhysRevLett.116.186603

This article is available under the terms of the Creative Commons Attribution 3.0 License. Further distribution of this work must maintain attribution to the author(s) and the published article’s title, journal citation, and DOI.

Published by the American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

E. E. Vdovin1,5,6, A. Mishchenko2, M. T. Greenaway1,*, M. J. Zhu2, D. Ghazaryan2, A. Misra3, Y. Cao4, S. V. Morozov5,6, O. Makarovsky1, T. M. Fromhold1, A. Patanè1, G. J. Slotman7, M. I. Katsnelson7, A. K. Geim2,4, K. S. Novoselov2,3, and L. Eaves1,2

  • 1School of Physics and Astronomy, University of Nottingham, Nottingham NG7 2RD, United Kingdom
  • 2School of Physics and Astronomy, University of Manchester, Manchester M13 9PL, United Kingdom
  • 3National Graphene Institute, University of Manchester, Manchester M13 9PL, United Kingdom
  • 4Centre for Mesoscience and Nanotechnology, University of Manchester, Manchester M13 9PL, United Kingdom
  • 5Institute of Microelectronics Technology and High Purity Materials, RAS, Chernogolovka 142432, Russia
  • 6National University of Science and Technology “MISiS,” 119049 Leninsky Prospect 4, Moscow, Russia
  • 7Radboud University, Institute for Molecules and Materials, Heyendaalseweg 135, 6525 AJ Nijmegen, The Netherlands

  • *mark.greenaway@nottingham.ac.uk

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Vol. 116, Iss. 18 — 6 May 2016

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