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Strong Asymmetric Charge Carrier Dependence in Inelastic Electron Tunneling Spectroscopy of Graphene Phonons

Fabian D. Natterer, Yue Zhao, Jonathan Wyrick, Yang-Hao Chan, Wen-Ying Ruan, Mei-Yin Chou, Kenji Watanabe, Takashi Taniguchi, Nikolai B. Zhitenev, and Joseph A. Stroscio
Phys. Rev. Lett. 114, 245502 – Published 16 June 2015
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Abstract

The observation of phonons in graphene by inelastic electron tunneling spectroscopy has been met with limited success in previous measurements arising from weak signals and other spectral features which inhibit a clear distinction between phonons and miscellaneous excitations. Utilizing a back-gated graphene device that allows adjusting the global charge carrier density, we introduce an averaging method where individual tunneling spectra at varying charge carrier density are combined into one representative spectrum. This method improves the signal for inelastic transitions while it suppresses dispersive spectral features. We thereby map the total graphene phonon density of states, in good agreement with density functional calculations. Unexpectedly, an abrupt change in the phonon intensity is observed when the graphene charge carrier type is switched through a variation of the back-gate electrode potential. This sudden variation in phonon intensity is asymmetric in the carrier type, depending on the sign of the tunneling bias.

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  • Received 26 February 2015

DOI:https://doi.org/10.1103/PhysRevLett.114.245502

© 2015 American Physical Society

Authors & Affiliations

Fabian D. Natterer1, Yue Zhao1,2, Jonathan Wyrick1, Yang-Hao Chan3, Wen-Ying Ruan3, Mei-Yin Chou3,4, Kenji Watanabe4, Takashi Taniguchi4, Nikolai B. Zhitenev1,5,*, and Joseph A. Stroscio1,†

  • 1Center for Nanoscale Science and Technology, National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA
  • 2Maryland NanoCenter, University of Maryland, College Park, Maryland 20742, USA
  • 3Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 10617, Taiwan
  • 4School of Physics, Georgia Institute of Technology, Atlanta, Georgia 30332, USA
  • 5Advanced Materials Laboratory, National Institute for Materials Science, Tsukuba, Ibaraki 305-0044 Japan

  • *To whom all correspondence should be addressed. nikolai.zhitenev@nist.gov
  • joseph.stroscio@nist.gov

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Issue

Vol. 114, Iss. 24 — 19 June 2015

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