Thermal Diffuse Scattering as a Probe of Large-Wave-Vector Phonons in Silicon Nanostructures

Gokul Gopalakrishnan, Martin V. Holt, Kyle M. McElhinny, Josef W. Spalenka, David A. Czaplewski, Tobias U. Schülli, and Paul G. Evans
Phys. Rev. Lett. 110, 205503 – Published 14 May 2013
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Abstract

Large-wave-vector phonons have an important role in determining the thermal and electronic properties of nanoscale materials. The small volumes of such structures, however, have posed significant challenges to experimental studies of the phonon dispersion. We show that synchrotron x-ray thermal diffuse scattering can be adapted to probe phonons with wave vectors spanning the entire Brillouin zone of nanoscale silicon membranes. The thermal diffuse scattering signal from flat Si nanomembranes with thicknesses from 315 to 6 nm, and a sample volume as small as 5μm3, has the expected linear dependence on the membrane thickness and also exhibits excess intensity at large wave vectors, consistent with the scattering signature expected from low-lying large-wave-vector modes of the membranes.

  • Received 24 January 2013

DOI:https://doi.org/10.1103/PhysRevLett.110.205503

© 2013 American Physical Society

Authors & Affiliations

Gokul Gopalakrishnan1,*, Martin V. Holt2, Kyle M. McElhinny1, Josef W. Spalenka1, David A. Czaplewski2, Tobias U. Schülli3, and Paul G. Evans1,†

  • 1Materials Science and Engineering and Materials Science Program, University of Wisconsin, Madison, Wisconsin 53706, USA
  • 2Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, USA
  • 3European Synchrotron Radiation Facility, F-38043 Grenoble, France

  • *gokul@engr.wisc.edu
  • evans@engr.wisc.edu

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Issue

Vol. 110, Iss. 20 — 17 May 2013

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