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Smallest Metallic Nanorods Using Physical Vapor Deposition

Xiaobin Niu, Stephen P. Stagon, Hanchen Huang, J. Kevin Baldwin, and Amit Misra
Phys. Rev. Lett. 110, 136102 – Published 28 March 2013
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Abstract

Physical vapor deposition provides a controllable means of growing two-dimensional metallic thin films and one-dimensional metallic nanorods. While theories exist for the growth of metallic thin films, their counterpart for the growth of metallic nanorods is absent. Because of this absence, the lower limit of the nanorod diameter is theoretically unknown; consequently the experimental pursuit of the smallest nanorods has no clear target. This Letter reports a closed-form theory that defines the diameter of the smallest metallic nanorods using physical vapor deposition. Further, the authors verify the theory using lattice kinetic Monte Carlo simulations and validate the theory using published experimental data. Finally, the authors carry out a series of theory-guided experiments to grow well-separated metallic nanorods of 10nm in diameter, which are the smallest ever reported using physical vapor deposition.

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  • Received 23 January 2013

DOI:https://doi.org/10.1103/PhysRevLett.110.136102

© 2013 American Physical Society

Synopsis

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Steps Towards Slimmer Nanorods

Published 28 March 2013

Metal nanorods grown by physical vapor deposition can be fabricated with a much narrower diameter than previously thought, potentially enabling the design of more efficient catalysts.

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Authors & Affiliations

Xiaobin Niu1, Stephen P. Stagon1, Hanchen Huang1,*, J. Kevin Baldwin2, and Amit Misra2

  • 1Department of Mechanical Engineering, University of Connecticut, Storrs, Connecticut 06269, USA
  • 2Los Alamos National Laboratory, MS K771, Los Alamos, New Mexico 87545, USA

  • *Corresponding author. hanchen@uconn.edu

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Issue

Vol. 110, Iss. 13 — 29 March 2013

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