Visualizing Atomic-Scale Negative Differential Resistance in Bilayer Graphene

Keun Su Kim, Tae-Hwan Kim, Andrew L. Walter, Thomas Seyller, Han Woong Yeom, Eli Rotenberg, and Aaron Bostwick
Phys. Rev. Lett. 110, 036804 – Published 18 January 2013
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Abstract

We investigate the atomic-scale tunneling characteristics of bilayer graphene on silicon carbide using the scanning tunneling microscopy. The high-resolution tunneling spectroscopy reveals an unexpected negative differential resistance (NDR) at the Dirac energy, which spatially varies within the single unit cell of bilayer graphene. The origin of NDR is explained by two near-gap van Hove singularities emerging in the electronic spectrum of bilayer graphene under a transverse electric field, which are strongly localized on two sublattices in different layers. Furthermore, defects near the tunneling contact are found to strongly impact on NDR through the electron interference. Our result provides an atomic-level understanding of quantum tunneling in bilayer graphene, and constitutes a useful step towards graphene-based tunneling devices.

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  • Received 16 August 2012

DOI:https://doi.org/10.1103/PhysRevLett.110.036804

© 2013 American Physical Society

Authors & Affiliations

Keun Su Kim1, Tae-Hwan Kim2, Andrew L. Walter1,3, Thomas Seyller4, Han Woong Yeom2,*, Eli Rotenberg1, and Aaron Bostwick1,†

  • 1Advanced Light Source, E. O. Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
  • 2Center for Low Dimensional Electronic Symmetry and Department of Physics, Pohang University of Science and Technology, Pohang 790-784, Korea
  • 3Department of Molecular Physics, Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, 14195 Berlin, Germany
  • 4Lehrstuhl für Technische Physik, Universität Erlangen-Nürnberg, Erwin-Rommel-Strasse 1, 91058 Erlangen, Germany

  • *yeom@postech.ac.kr
  • abostwick@lbl.gov

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Vol. 110, Iss. 3 — 18 January 2013

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