One-Dimensional to Three-Dimensional Ripple-to-Dome Transition for SiGe on Vicinal Si (1 1 10)

B. Sanduijav, D. Scopece, D. Matei, G. Chen, F. Schäffler, L. Miglio, and G. Springholz
Phys. Rev. Lett. 109, 025505 – Published 12 July 2012

Abstract

SiGe heteroepitaxy on vicinal Si (1 1 10) is studied as a model system for one-dimensional (1D) to three-dimensional growth mode transitions. By in situ scanning tunneling microscopy it is shown that the 1D-3D transition proceeds smoothly from perfectly facetted 1D nanoripples to coarsened superripples, tadpoles, asymmetric domes, and barns without involving coalescence or agglomeration. By extension of the studies to a wide range of SiGe compositions, a 1D-3D growth phase diagram is obtained. Total energy calculations reveal that the observed critical transition volumes are fully consistent with thermodynamic driven strain relaxation.

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  • Received 27 March 2012

DOI:https://doi.org/10.1103/PhysRevLett.109.025505

© 2012 American Physical Society

Authors & Affiliations

B. Sanduijav1, D. Scopece2, D. Matei1, G. Chen1,*, F. Schäffler1, L. Miglio2, and G. Springholz1,†

  • 1Institut für Halbleiter- und Festkörperphysik, Johannes Kepler University, A-4040 Linz, Austria
  • 2L-NESS and Department of Materials Science, Università di Milano-Bicocca, Milano, Italy

  • *gang.chen@jku.at
  • gunther.springholz@jku.at

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Vol. 109, Iss. 2 — 13 July 2012

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