Abstract
By saturating a photochromic transition with a nodal illumination (wavelength, ), one isomeric form of a small molecule is spatially localized to a region smaller than the far-field diffraction limit. A selective oxidation step effectively locks this pattern allowing repeated patterning. Using this approach and a two-beam interferometer, we demonstrate isolated lines as narrow as (78 nm) and spacing between features as narrow as (153 nm). This is considerably smaller than the minimum far-field diffraction limit of . Most significantly, nanopatterning is achieved via single-photon reactions and at low light levels, which in turn allow for high throughput.
- Received 8 July 2011
DOI:https://doi.org/10.1103/PhysRevLett.107.205501
© 2011 American Physical Society