Nearly Massless Electrons in the Silicon Interface with a Metal Film

Keun Su Kim, Sung Chul Jung, Myung Ho Kang, and Han Woong Yeom
Phys. Rev. Lett. 104, 246803 – Published 16 June 2010
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Abstract

We demonstrate the realization of nearly massless electrons in the most widely used device material, silicon, at the interface with a metal film. Using angle-resolved photoemission, we found that the surface band of a monolayer lead film drives a hole band of the Si inversion layer formed at the interface with the film to have a nearly linear dispersion with an effective mass about 20 times lighter than bulk Si and comparable to graphene. The reduction of mass can be accounted for by a repulsive interaction between neighboring bands of the metal film and Si substrate. Our result suggests a promising way to take advantage of massless carriers in silicon-based thin-film devices, which can also be applied to various other semiconductor devices.

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  • Received 17 February 2010

DOI:https://doi.org/10.1103/PhysRevLett.104.246803

©2010 American Physical Society

Authors & Affiliations

Keun Su Kim1, Sung Chul Jung2, Myung Ho Kang2, and Han Woong Yeom1,2,*

  • 1Center for Atomic Wires and Layers, Pohang University of Science and Technology, Pohang 790-784, Korea
  • 2Department of Physics, Pohang University of Science and Technology, Pohang 790-784, Korea

  • *yeom@postech.ac.kr

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Issue

Vol. 104, Iss. 24 — 18 June 2010

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